夜间135.6 nm气辉反演的电离层<italic>f</italic><sub>0</sub><italic>F</italic><sub>2</sub>与测高仪观测比较研究
在夜间电离层,气辉135.6 nm谱线主要由F层的O<sup>+</sup>和电子的辐射复合过程以及O<sup>+</sup>和O<sup>–</sup>的中性复合过程激发,该谱线强度和电离层峰值电子密度<italic>N</italic><sub>m</sub><italic>F</italic><sub>2</sub>存在很强的相关性。利用夜气辉135.6 nm辐射强度与<italic>F</italic&...
Main Authors: | 薛 仕翔, 姜 春华, 马 征征, 徐 彬, 丁 广兴, 杨 国斌, 张 援农, 赵 正予 |
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Format: | Article |
Language: | English |
Published: |
Science Press
2023-07-01
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Series: | Kongjian kexue xuebao |
Subjects: | |
Online Access: | https://www.sciengine.com/doi/10.11728/cjss2023.03.2022-0018 |
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