Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma
Plasma cleaning is a promising technology in surface treatments, despite technological interest its use is limited because its mechanisms still are not entirely understood. This work aims to evaluate how the applied power of an inductively coupled RF discharge at 13,56 MHz, with Ar and Ar+10%O2 atmo...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
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Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)
2014-10-01
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| Series: | Materials Research |
| Subjects: | |
| Online Access: | http://www.scielo.br/pdf/mr/v17n5/aop_matres_270714.pdf |
| _version_ | 1819003588882464768 |
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| author | Carlos Eduardo Farias José Carlos Bianchi Paulo Roberto de Oliveira Paulo César Borges Euclides Alexandre Bernardelli Thierry Belmonte Márcio Mafra |
| author_facet | Carlos Eduardo Farias José Carlos Bianchi Paulo Roberto de Oliveira Paulo César Borges Euclides Alexandre Bernardelli Thierry Belmonte Márcio Mafra |
| author_sort | Carlos Eduardo Farias |
| collection | DOAJ |
| description | Plasma cleaning is a promising technology in surface treatments, despite technological interest its use is limited because its mechanisms still are not entirely understood. This work aims to evaluate how the applied power of an inductively coupled RF discharge at 13,56 MHz, with Ar and Ar+10%O2 atmospheres, affects its capabilities to etch an organic molecule. Mass variation rate was used as direct characterization of degradation process and attenuated total reflection-Fourier transform infrared spectroscopy (ATR-FTIR) was performed to search for residual molecular modifications. Additionally, optical emission spectroscopy (OES) measurements were performed to monitor the offer of active species in the gaseous volume. In experimental conditions was possible attain mass reduction from sample, with higher mass loss rate when applied power is increased. Material characterization shows the possibility of attain a high etch rate, while no structural modifications were detected, if the temperature is controlled. |
| first_indexed | 2024-12-20T23:23:24Z |
| format | Article |
| id | doaj.art-ff40678f809245be9d647ef6ebe2fb13 |
| institution | Directory Open Access Journal |
| issn | 1516-1439 |
| language | English |
| last_indexed | 2024-12-20T23:23:24Z |
| publishDate | 2014-10-01 |
| publisher | Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) |
| record_format | Article |
| series | Materials Research |
| spelling | doaj.art-ff40678f809245be9d647ef6ebe2fb132022-12-21T19:23:28ZengAssociação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)Materials Research1516-14392014-10-011751251125910.1590/1516-1439.270714Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasmaCarlos Eduardo Farias0José Carlos Bianchi1Paulo Roberto de Oliveira2Paulo César Borges3Euclides Alexandre Bernardelli4Thierry Belmonte5Márcio Mafra6Federal University of TechnologyFederal University of TechnologyFederal University of TechnologyFederal University of TechnologyFederal Institute of ParanáInstitut Jean LamourFederal University of TechnologyPlasma cleaning is a promising technology in surface treatments, despite technological interest its use is limited because its mechanisms still are not entirely understood. This work aims to evaluate how the applied power of an inductively coupled RF discharge at 13,56 MHz, with Ar and Ar+10%O2 atmospheres, affects its capabilities to etch an organic molecule. Mass variation rate was used as direct characterization of degradation process and attenuated total reflection-Fourier transform infrared spectroscopy (ATR-FTIR) was performed to search for residual molecular modifications. Additionally, optical emission spectroscopy (OES) measurements were performed to monitor the offer of active species in the gaseous volume. In experimental conditions was possible attain mass reduction from sample, with higher mass loss rate when applied power is increased. Material characterization shows the possibility of attain a high etch rate, while no structural modifications were detected, if the temperature is controlled.http://www.scielo.br/pdf/mr/v17n5/aop_matres_270714.pdfplasma cleaningetchingstearic acid |
| spellingShingle | Carlos Eduardo Farias José Carlos Bianchi Paulo Roberto de Oliveira Paulo César Borges Euclides Alexandre Bernardelli Thierry Belmonte Márcio Mafra Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma Materials Research plasma cleaning etching stearic acid |
| title | Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
| title_full | Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
| title_fullStr | Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
| title_full_unstemmed | Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
| title_short | Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
| title_sort | evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma |
| topic | plasma cleaning etching stearic acid |
| url | http://www.scielo.br/pdf/mr/v17n5/aop_matres_270714.pdf |
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