CC-De-YOLO: A Multiscale Object Detection Method for Wafer Surface Defect

Surface defect detection on wafers is crucial for quality control in semiconductor manufacturing. However, the complexity of defect spatial features, including mixed defect types, large scale differences, and overlapping, results in low detection accuracy. In this paper, we propose a CC-De-YOLO mode...

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Bibliographic Details
Main Authors: Ma Jianhong, Zhang Tao, Ma Xiaoyan, Tian Hui
Format: Article
Language:English
Published: Sciendo 2024-09-01
Series:Foundations of Computing and Decision Sciences
Subjects:
Online Access:https://doi.org/10.2478/fcds-2024-0014