Stress effects on the Raman spectrum of an amorphous material: Theory and experiment on a-Si:H

Strain in a material induces shifts in vibrational frequencies. This phenomenon is a probe of the nature of the vibrations and interatomic potentials and can be used to map local stress/strain distributions via Raman microscopy. This method is standard for crystalline silicon devices, but due to the...

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Bibliographic Details
Main Authors: Johlin, Eric C., Kirkpatrick, Timothy R., Buonassisi, Tonio, Grossman, Jeffrey C., Strubbe, David
Other Authors: Massachusetts Institute of Technology. Department of Materials Science and Engineering
Format: Article
Language:English
Published: American Physical Society 2016
Online Access:http://hdl.handle.net/1721.1/100737
https://orcid.org/0000-0002-2432-8575
https://orcid.org/0000-0003-2426-5532
https://orcid.org/0000-0001-8345-4937