High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field
Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit an...
| Main Authors: | , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
Nature Publishing Group
2016
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| Online Access: | http://hdl.handle.net/1721.1/100905 |