High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field
Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit an...
| Main Authors: | , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | en_US |
| Published: |
Nature Publishing Group
2016
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| Online Access: | http://hdl.handle.net/1721.1/100905 |
| _version_ | 1826203130575978496 |
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| author | Wen, X. Datta, A. Traverso, L. M. Pan, L. Xu, X. Moon, Euclid Eberle |
| author2 | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
| author_facet | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Wen, X. Datta, A. Traverso, L. M. Pan, L. Xu, X. Moon, Euclid Eberle |
| author_sort | Wen, X. |
| collection | MIT |
| description | Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy. |
| first_indexed | 2024-09-23T12:32:08Z |
| format | Article |
| id | mit-1721.1/100905 |
| institution | Massachusetts Institute of Technology |
| language | en_US |
| last_indexed | 2024-09-23T12:32:08Z |
| publishDate | 2016 |
| publisher | Nature Publishing Group |
| record_format | dspace |
| spelling | mit-1721.1/1009052022-09-28T08:23:25Z High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field Wen, X. Datta, A. Traverso, L. M. Pan, L. Xu, X. Moon, Euclid Eberle Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Moon, Euclid Eberle Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy. United States. Defense Advanced Research Projects Agency (Grant N66001-08-1-2037) National Science Foundation (U.S.) (Grant CMMI-1120577) National Science Foundation (U.S.) (Grant CMMI-1405078) 2016-01-18T23:01:20Z 2016-01-18T23:01:20Z 2015-11 2015-04 Article http://purl.org/eprint/type/JournalArticle 2045-2322 http://hdl.handle.net/1721.1/100905 Wen, X., A. Datta, L. M. Traverso, L. Pan, X. Xu, and E. E. Moon. “High Throughput Optical Lithography by Scanning a Massive Array of Bowtie Aperture Antennas at Near-Field.” Scientific Reports 5 (November 3, 2015): 16192. en_US http://dx.doi.org/10.1038/srep16192 Scientific Reports Creative Commons Attribution http://creativecommons.org/licenses/by/4.0/ application/pdf Nature Publishing Group Nature Publishing Group |
| spellingShingle | Wen, X. Datta, A. Traverso, L. M. Pan, L. Xu, X. Moon, Euclid Eberle High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field |
| title | High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field |
| title_full | High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field |
| title_fullStr | High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field |
| title_full_unstemmed | High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field |
| title_short | High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field |
| title_sort | high throughput optical lithography by scanning a massive array of bowtie aperture antennas at near field |
| url | http://hdl.handle.net/1721.1/100905 |
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