Multilayer block copolymer meshes by orthogonal self-assembly
Continued scaling-down of lithographic-pattern feature sizes has brought templated self-assembly of block copolymers (BCPs) into the forefront of nanofabrication research. Technologies now exist that facilitate significant control over otherwise unorganized assembly of BCP microdomains to form both...
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Nature Publishing Group
2016
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Online Access: | http://hdl.handle.net/1721.1/101867 https://orcid.org/0000-0003-2262-1249 https://orcid.org/0000-0002-9498-7808 https://orcid.org/0000-0003-3329-9099 https://orcid.org/0000-0002-6000-3364 https://orcid.org/0000-0001-7453-9031 https://orcid.org/0000-0001-5554-1283 |
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author | Alexander-Katz, Alfredo Ross, Caroline A. Berggren, Karl K. Tavakkoli Kermani Ghariehali, Amir Nicaise, Sam Gadelrab, Karim Raafat |
author2 | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
author_facet | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Alexander-Katz, Alfredo Ross, Caroline A. Berggren, Karl K. Tavakkoli Kermani Ghariehali, Amir Nicaise, Sam Gadelrab, Karim Raafat |
author_sort | Alexander-Katz, Alfredo |
collection | MIT |
description | Continued scaling-down of lithographic-pattern feature sizes has brought templated self-assembly of block copolymers (BCPs) into the forefront of nanofabrication research. Technologies now exist that facilitate significant control over otherwise unorganized assembly of BCP microdomains to form both long-range and locally complex monolayer patterns. In contrast, the extension of this control into multilayers or 3D structures of BCP microdomains remains limited, despite the possible technological applications in next-generation devices. Here, we develop and analyse an orthogonal self-assembly method in which multiple layers of distinct-molecular-weight BCPs naturally produce nanomesh structures of cylindrical microdomains without requiring layer-by-layer alignment or high-resolution lithographic templating. The mechanisms for orthogonal self-assembly are investigated with both experiment and simulation, and we determine that the control over height and chemical preference of templates are critical process parameters. The method is employed to produce nanomeshes with the shapes of circles and Y-intersections, and is extended to produce three layers of orthogonally oriented cylinders. |
first_indexed | 2024-09-23T10:56:32Z |
format | Article |
id | mit-1721.1/101867 |
institution | Massachusetts Institute of Technology |
language | en_US |
last_indexed | 2024-09-23T10:56:32Z |
publishDate | 2016 |
publisher | Nature Publishing Group |
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spelling | mit-1721.1/1018672022-09-27T16:06:20Z Multilayer block copolymer meshes by orthogonal self-assembly Alexander-Katz, Alfredo Ross, Caroline A. Berggren, Karl K. Tavakkoli Kermani Ghariehali, Amir Nicaise, Sam Gadelrab, Karim Raafat Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology. Department of Materials Science and Engineering Tavakkoli Kermani Ghariehali, Amir Nicaise, Sam Gadelrab, Karim Raafat Alexander-Katz, Alfredo Ross, Caroline A. Berggren, Karl K. Continued scaling-down of lithographic-pattern feature sizes has brought templated self-assembly of block copolymers (BCPs) into the forefront of nanofabrication research. Technologies now exist that facilitate significant control over otherwise unorganized assembly of BCP microdomains to form both long-range and locally complex monolayer patterns. In contrast, the extension of this control into multilayers or 3D structures of BCP microdomains remains limited, despite the possible technological applications in next-generation devices. Here, we develop and analyse an orthogonal self-assembly method in which multiple layers of distinct-molecular-weight BCPs naturally produce nanomesh structures of cylindrical microdomains without requiring layer-by-layer alignment or high-resolution lithographic templating. The mechanisms for orthogonal self-assembly are investigated with both experiment and simulation, and we determine that the control over height and chemical preference of templates are critical process parameters. The method is employed to produce nanomeshes with the shapes of circles and Y-intersections, and is extended to produce three layers of orthogonally oriented cylinders. National Science Foundation (U.S.) (CMMI-1246740) Semiconductor Research Corporation Taiwan Semiconductor Manufacturing Company 2016-03-25T13:57:22Z 2016-03-25T13:57:22Z 2016-01 2015-09 Article http://purl.org/eprint/type/JournalArticle 2041-1723 http://hdl.handle.net/1721.1/101867 Tavakkoli K. G., Amir, Samuel M. Nicaise, Karim R. Gadelrab, Alfredo Alexander-Katz, Caroline A. Ross, and Karl K. Berggren. “Multilayer Block Copolymer Meshes by Orthogonal Self-Assembly.” Nat Comms 7 (January 22, 2016): 10518. https://orcid.org/0000-0003-2262-1249 https://orcid.org/0000-0002-9498-7808 https://orcid.org/0000-0003-3329-9099 https://orcid.org/0000-0002-6000-3364 https://orcid.org/0000-0001-7453-9031 https://orcid.org/0000-0001-5554-1283 en_US http://dx.doi.org/10.1038/ncomms10518 Nature Communications Creative Commons Attribution http://creativecommons.org/licenses/by/4.0/ application/pdf Nature Publishing Group Nature Publishing Group |
spellingShingle | Alexander-Katz, Alfredo Ross, Caroline A. Berggren, Karl K. Tavakkoli Kermani Ghariehali, Amir Nicaise, Sam Gadelrab, Karim Raafat Multilayer block copolymer meshes by orthogonal self-assembly |
title | Multilayer block copolymer meshes by orthogonal self-assembly |
title_full | Multilayer block copolymer meshes by orthogonal self-assembly |
title_fullStr | Multilayer block copolymer meshes by orthogonal self-assembly |
title_full_unstemmed | Multilayer block copolymer meshes by orthogonal self-assembly |
title_short | Multilayer block copolymer meshes by orthogonal self-assembly |
title_sort | multilayer block copolymer meshes by orthogonal self assembly |
url | http://hdl.handle.net/1721.1/101867 https://orcid.org/0000-0003-2262-1249 https://orcid.org/0000-0002-9498-7808 https://orcid.org/0000-0003-3329-9099 https://orcid.org/0000-0002-6000-3364 https://orcid.org/0000-0001-7453-9031 https://orcid.org/0000-0001-5554-1283 |
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