Optical nanolithography with λ/15 resolution using bowtie aperture array

Optical nanolithography with λ/15 resolution using bowtie aperture array

We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the d...

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Bibliographic Details
Main Authors: Wen, Xiaolei, Srisungsitthisunti, Pornsak, Xu, Xianfan, Traverso, Luis M., Moon, Euclid Eberle
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:English
Published: Springer Berlin Heidelberg 2016
Online Access:http://hdl.handle.net/1721.1/104444

Internet

http://hdl.handle.net/1721.1/104444

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