Optical nanolithography with λ/15 resolution using bowtie aperture array
We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the d...
| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
Springer Berlin Heidelberg
2016
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| Online Access: | http://hdl.handle.net/1721.1/104444 |
| _version_ | 1811080483184836608 |
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| author | Wen, Xiaolei Srisungsitthisunti, Pornsak Xu, Xianfan Traverso, Luis M. Moon, Euclid Eberle |
| author2 | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
| author_facet | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Wen, Xiaolei Srisungsitthisunti, Pornsak Xu, Xianfan Traverso, Luis M. Moon, Euclid Eberle |
| author_sort | Wen, Xiaolei |
| collection | MIT |
| description | We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and low cost, which is promising for practical applications. |
| first_indexed | 2024-09-23T11:32:24Z |
| format | Article |
| id | mit-1721.1/104444 |
| institution | Massachusetts Institute of Technology |
| language | English |
| last_indexed | 2024-09-23T11:32:24Z |
| publishDate | 2016 |
| publisher | Springer Berlin Heidelberg |
| record_format | dspace |
| spelling | mit-1721.1/1044442022-10-01T04:19:28Z Optical nanolithography with λ/15 resolution using bowtie aperture array Wen, Xiaolei Srisungsitthisunti, Pornsak Xu, Xianfan Traverso, Luis M. Moon, Euclid Eberle Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Moon, Euclid Eberle We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and low cost, which is promising for practical applications. United States. Defense Advanced Research Projects Agency (Grant N66001-08-1-2037) National Science Foundation (U.S.) (Grant CMMI-1120577) 2016-09-29T18:48:37Z 2016-09-29T18:48:37Z 2014-01 2013-10 2016-08-18T15:24:58Z Article http://purl.org/eprint/type/JournalArticle 0947-8396 1432-0630 http://hdl.handle.net/1721.1/104444 Wen, Xiaolei et al. “Optical Nanolithography with λ/15 Resolution Using Bowtie Aperture Array.” Applied Physics A 117.1 (2014): 307–311. en http://dx.doi.org/10.1007/s00339-014-8265-y Applied Physics A Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. Springer-Verlag Berlin Heidelberg application/pdf Springer Berlin Heidelberg Springer Berlin Heidelberg |
| spellingShingle | Wen, Xiaolei Srisungsitthisunti, Pornsak Xu, Xianfan Traverso, Luis M. Moon, Euclid Eberle Optical nanolithography with λ/15 resolution using bowtie aperture array |
| title | Optical nanolithography with λ/15 resolution using bowtie aperture array |
| title_full | Optical nanolithography with λ/15 resolution using bowtie aperture array |
| title_fullStr | Optical nanolithography with λ/15 resolution using bowtie aperture array |
| title_full_unstemmed | Optical nanolithography with λ/15 resolution using bowtie aperture array |
| title_short | Optical nanolithography with λ/15 resolution using bowtie aperture array |
| title_sort | optical nanolithography with λ 15 resolution using bowtie aperture array |
| url | http://hdl.handle.net/1721.1/104444 |
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