Optical nanolithography with λ/15 resolution using bowtie aperture array
We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the d...
Main Authors: | Wen, Xiaolei, Srisungsitthisunti, Pornsak, Xu, Xianfan, Traverso, Luis M., Moon, Euclid Eberle |
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Other Authors: | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science |
Format: | Article |
Language: | English |
Published: |
Springer Berlin Heidelberg
2016
|
Online Access: | http://hdl.handle.net/1721.1/104444 |
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