Real-time analysis and control of plasma etching via full wafer interferometry

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996.

Bibliografski detalji
Glavni autor: Wong, Ka Shun
Daljnji autori: Duane S. Boning.
Format: Disertacija
Jezik:eng
Izdano: Massachusetts Institute of Technology 2005
Teme:
Online pristup:http://hdl.handle.net/1721.1/10682