Out-of-plane neural microelectrode arrays fabrication using conventional blade dicing

\This paper describes an optimized out-of-plane fabrication method for neural 3D high-aspect-ratio microelectrode array (MEA) based on a dicing technology platform (a standard procedure in semiconductor industry). The proposed MEA fabrication required important modifications in the dicing process. S...

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Main Authors: Oliveira, M. J., Peixoto, A. C., Correia, J. H., Goncalves, S. B, Silva, A. F.
Other Authors: MIT-Portugal Program
Format: Article
Language:English
Published: Springer London 2017
Online Access:http://hdl.handle.net/1721.1/106833
_version_ 1826211414109323264
author Oliveira, M. J.
Peixoto, A. C.
Correia, J. H.
Goncalves, S. B
Silva, A. F.
author2 MIT-Portugal Program
author_facet MIT-Portugal Program
Oliveira, M. J.
Peixoto, A. C.
Correia, J. H.
Goncalves, S. B
Silva, A. F.
author_sort Oliveira, M. J.
collection MIT
description \This paper describes an optimized out-of-plane fabrication method for neural 3D high-aspect-ratio microelectrode array (MEA) based on a dicing technology platform (a standard procedure in semiconductor industry). The proposed MEA fabrication required important modifications in the dicing process. Since electrodes length reaches up to 4 mm, the main hindrance was the 2 mm cutting depth limit allowed for dicing machines with regular blades. This new procedure consisted on modifying Z-axis calibration, so cuts as deep as the exposure of blades were possible. The employment of proper blades for each fabrication step was also mandatory. Thin and high-exposure blades were used for deep cuts in silicon wafers, and V-shaped blades were employed to produce sharpened tips on the electrodes. Moreover, parameters as very low-cut speeds were essential to avoid wafer chipping and microcracks. Results showed high-precision and high-quality cuts in all steps of the 3D MEA fabrication, without unnecessary additional steps of etching post-processing. The optimized fabrication process was successfully demonstrated with a 3D neural probe array comprising 36 individually addressable electrodes.
first_indexed 2024-09-23T15:05:30Z
format Article
id mit-1721.1/106833
institution Massachusetts Institute of Technology
language English
last_indexed 2024-09-23T15:05:30Z
publishDate 2017
publisher Springer London
record_format dspace
spelling mit-1721.1/1068332022-10-02T00:32:56Z Out-of-plane neural microelectrode arrays fabrication using conventional blade dicing Oliveira, M. J. Peixoto, A. C. Correia, J. H. Goncalves, S. B Silva, A. F. MIT-Portugal Program Goncalves, S. B Silva, A. F. \This paper describes an optimized out-of-plane fabrication method for neural 3D high-aspect-ratio microelectrode array (MEA) based on a dicing technology platform (a standard procedure in semiconductor industry). The proposed MEA fabrication required important modifications in the dicing process. Since electrodes length reaches up to 4 mm, the main hindrance was the 2 mm cutting depth limit allowed for dicing machines with regular blades. This new procedure consisted on modifying Z-axis calibration, so cuts as deep as the exposure of blades were possible. The employment of proper blades for each fabrication step was also mandatory. Thin and high-exposure blades were used for deep cuts in silicon wafers, and V-shaped blades were employed to produce sharpened tips on the electrodes. Moreover, parameters as very low-cut speeds were essential to avoid wafer chipping and microcracks. Results showed high-precision and high-quality cuts in all steps of the 3D MEA fabrication, without unnecessary additional steps of etching post-processing. The optimized fabrication process was successfully demonstrated with a 3D neural probe array comprising 36 individually addressable electrodes. 2017-02-02T19:51:21Z 2017-02-02T19:51:21Z 2015-10 2014-12 2017-02-02T15:20:07Z Article http://purl.org/eprint/type/JournalArticle 0268-3768 1433-3015 http://hdl.handle.net/1721.1/106833 Goncalves, S. B. et al. “Out-of-Plane Neural Microelectrode Arrays Fabrication Using Conventional Blade Dicing.” The International Journal of Advanced Manufacturing Technology 85.1–4 (2016): 431–442. en http://dx.doi.org/10.1007/s00170-015-7948-7 The International Journal of Advanced Manufacturing Technology Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use. Springer-Verlag London application/pdf Springer London Springer London
spellingShingle Oliveira, M. J.
Peixoto, A. C.
Correia, J. H.
Goncalves, S. B
Silva, A. F.
Out-of-plane neural microelectrode arrays fabrication using conventional blade dicing
title Out-of-plane neural microelectrode arrays fabrication using conventional blade dicing
title_full Out-of-plane neural microelectrode arrays fabrication using conventional blade dicing
title_fullStr Out-of-plane neural microelectrode arrays fabrication using conventional blade dicing
title_full_unstemmed Out-of-plane neural microelectrode arrays fabrication using conventional blade dicing
title_short Out-of-plane neural microelectrode arrays fabrication using conventional blade dicing
title_sort out of plane neural microelectrode arrays fabrication using conventional blade dicing
url http://hdl.handle.net/1721.1/106833
work_keys_str_mv AT oliveiramj outofplaneneuralmicroelectrodearraysfabricationusingconventionalbladedicing
AT peixotoac outofplaneneuralmicroelectrodearraysfabricationusingconventionalbladedicing
AT correiajh outofplaneneuralmicroelectrodearraysfabricationusingconventionalbladedicing
AT goncalvessb outofplaneneuralmicroelectrodearraysfabricationusingconventionalbladedicing
AT silvaaf outofplaneneuralmicroelectrodearraysfabricationusingconventionalbladedicing