Fluorinated benzalkylsilane molecular rectifiers

We report on the synthesis and electrical properties of nine new alkylated silane self-assembled monolayers (SAMs) – (EtO)3Si(CH2)nN = CHPhX where n = 3 or 11 and X = 4-CF[subscript 3], 3,5-CF[subscript 3], 3-F-4-CF[subscript 3], 4-F, or 2,3,4,5,6-F, and explore their rectification behavior in relat...

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Main Authors: Lamport, Zachary A., Broadnax, Angela D., Harrison, David, Barth, Katrina J., Mendenhall, Lee, Hamilton, Clayton T., Guthold, Martin, Thonhauser, Timo, Welker, Mark E., Jurchescu, Oana D.
Other Authors: Massachusetts Institute of Technology. Department of Chemistry
Format: Article
Language:en_US
Published: Nature Publishing Group 2017
Online Access:http://hdl.handle.net/1721.1/107785
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author Lamport, Zachary A.
Broadnax, Angela D.
Harrison, David
Barth, Katrina J.
Mendenhall, Lee
Hamilton, Clayton T.
Guthold, Martin
Thonhauser, Timo
Welker, Mark E.
Jurchescu, Oana D.
author2 Massachusetts Institute of Technology. Department of Chemistry
author_facet Massachusetts Institute of Technology. Department of Chemistry
Lamport, Zachary A.
Broadnax, Angela D.
Harrison, David
Barth, Katrina J.
Mendenhall, Lee
Hamilton, Clayton T.
Guthold, Martin
Thonhauser, Timo
Welker, Mark E.
Jurchescu, Oana D.
author_sort Lamport, Zachary A.
collection MIT
description We report on the synthesis and electrical properties of nine new alkylated silane self-assembled monolayers (SAMs) – (EtO)3Si(CH2)nN = CHPhX where n = 3 or 11 and X = 4-CF[subscript 3], 3,5-CF[subscript 3], 3-F-4-CF[subscript 3], 4-F, or 2,3,4,5,6-F, and explore their rectification behavior in relation to their molecular structure. The electrical properties of the films were examined in a metal/insulator/metal configuration, with a highly-doped silicon bottom contact and a eutectic gallium-indium liquid metal (EGaIn) top contact. The junctions exhibit high yields (>90%), a remarkable resistance to bias stress, and current rectification ratios (R) between 20 and 200 depending on the structure, degree of order, and internal dipole of each molecule. We found that the rectification ratio correlates positively with the strength of the molecular dipole moment and it is reduced with increasing molecular length.
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spelling mit-1721.1/1077852022-09-29T14:28:41Z Fluorinated benzalkylsilane molecular rectifiers Lamport, Zachary A. Broadnax, Angela D. Harrison, David Barth, Katrina J. Mendenhall, Lee Hamilton, Clayton T. Guthold, Martin Thonhauser, Timo Welker, Mark E. Jurchescu, Oana D. Massachusetts Institute of Technology. Department of Chemistry Thonhauser, Timo We report on the synthesis and electrical properties of nine new alkylated silane self-assembled monolayers (SAMs) – (EtO)3Si(CH2)nN = CHPhX where n = 3 or 11 and X = 4-CF[subscript 3], 3,5-CF[subscript 3], 3-F-4-CF[subscript 3], 4-F, or 2,3,4,5,6-F, and explore their rectification behavior in relation to their molecular structure. The electrical properties of the films were examined in a metal/insulator/metal configuration, with a highly-doped silicon bottom contact and a eutectic gallium-indium liquid metal (EGaIn) top contact. The junctions exhibit high yields (>90%), a remarkable resistance to bias stress, and current rectification ratios (R) between 20 and 200 depending on the structure, degree of order, and internal dipole of each molecule. We found that the rectification ratio correlates positively with the strength of the molecular dipole moment and it is reduced with increasing molecular length. National Science Foundation (U.S.) (Award ECCS 1254757) Wake Forest University (Pilot Research Grant) 2017-03-30T18:24:34Z 2017-03-30T18:24:34Z 2016-11 2016-09 Article http://purl.org/eprint/type/JournalArticle 2045-2322 http://hdl.handle.net/1721.1/107785 Lamport, Zachary A. et al. “Fluorinated Benzalkylsilane Molecular Rectifiers.” Scientific Reports 6.1 (2016): n. pag. en_US http://dx.doi.org/10.1038/srep38092 Scientific Reports Creative Commons Attribution 4.0 International License http://creativecommons.org/licenses/by/4.0/ application/pdf Nature Publishing Group Nature
spellingShingle Lamport, Zachary A.
Broadnax, Angela D.
Harrison, David
Barth, Katrina J.
Mendenhall, Lee
Hamilton, Clayton T.
Guthold, Martin
Thonhauser, Timo
Welker, Mark E.
Jurchescu, Oana D.
Fluorinated benzalkylsilane molecular rectifiers
title Fluorinated benzalkylsilane molecular rectifiers
title_full Fluorinated benzalkylsilane molecular rectifiers
title_fullStr Fluorinated benzalkylsilane molecular rectifiers
title_full_unstemmed Fluorinated benzalkylsilane molecular rectifiers
title_short Fluorinated benzalkylsilane molecular rectifiers
title_sort fluorinated benzalkylsilane molecular rectifiers
url http://hdl.handle.net/1721.1/107785
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