UV-solvent annealing of PDMS-majority and PS-majority PS-

UV-solvent annealing of PDMS-majority and PS-majority PS-

The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f[subscript]PS = 68%...

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Bibliographic Details
Main Authors: Ntetsikas, K, Liontos, G, Avgeropoulos, A, Lee, Keehong, Kreider, Melissa E., Bai, Wubin, Cheng, Li-Chen, Dinachali, Saman Safari, Tu, Kun-Hua, Huang, Tao, Ross, Caroline A
Other Authors: Massachusetts Institute of Technology. Department of Chemical Engineering
Format: Article
Published: IOP Publishing 2017
Online Access:http://hdl.handle.net/1721.1/112191
https://orcid.org/0000-0002-8554-6998
https://orcid.org/0000-0001-9975-9903
https://orcid.org/0000-0003-0559-8219
https://orcid.org/0000-0003-2262-1249

Internet

http://hdl.handle.net/1721.1/112191
https://orcid.org/0000-0002-8554-6998
https://orcid.org/0000-0001-9975-9903
https://orcid.org/0000-0003-0559-8219
https://orcid.org/0000-0003-2262-1249

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