UV-solvent annealing of PDMS-majority and PS-majority PS-
The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f[subscript]PS = 68%...
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| Formatua: | Artikulua |
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IOP Publishing
2017
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| Sarrera elektronikoa: | http://hdl.handle.net/1721.1/112191 https://orcid.org/0000-0002-8554-6998 https://orcid.org/0000-0001-9975-9903 https://orcid.org/0000-0003-0559-8219 https://orcid.org/0000-0003-2262-1249 |
| _version_ | 1826205658887749632 |
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| author | Ntetsikas, K Liontos, G Avgeropoulos, A Lee, Keehong Kreider, Melissa E. Bai, Wubin Cheng, Li-Chen Dinachali, Saman Safari Tu, Kun-Hua Huang, Tao Ross, Caroline A |
| author2 | Massachusetts Institute of Technology. Department of Chemical Engineering |
| author_facet | Massachusetts Institute of Technology. Department of Chemical Engineering Ntetsikas, K Liontos, G Avgeropoulos, A Lee, Keehong Kreider, Melissa E. Bai, Wubin Cheng, Li-Chen Dinachali, Saman Safari Tu, Kun-Hua Huang, Tao Ross, Caroline A |
| author_sort | Ntetsikas, K |
| collection | MIT |
| description | The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f[subscript]PS = 68%, M[subscript n]= 53 kg mol[subscript -1]), the other with PDMS block as majority (f[subscript PDMS]= 67%, M[subscript n] = 44 kg mol [superscript -1] ). A 5 min UV irradiation was applied during solvent vapor annealing which led to both partial crosslinking of the polymer and a small increase in the temperature of the annealing chamber. This approach was effective for improving the correlation length of the self-assembled microdomain arrays and in limiting subsequent flow of the PDMS in the PDMS-majority BCP to preserve the post-anneal morphology. Ordering and orientation of microdomains were controlled by directed self-assembly of the BCPs in trench substrates. Highly-ordered perpendicular nanochannel arrays were obtained in the PDMS-majority BCP. |
| first_indexed | 2024-09-23T13:16:34Z |
| format | Article |
| id | mit-1721.1/112191 |
| institution | Massachusetts Institute of Technology |
| last_indexed | 2024-09-23T13:16:34Z |
| publishDate | 2017 |
| publisher | IOP Publishing |
| record_format | dspace |
| spelling | mit-1721.1/1121912022-09-28T13:07:32Z UV-solvent annealing of PDMS-majority and PS-majority PS- Ntetsikas, K Liontos, G Avgeropoulos, A Lee, Keehong Kreider, Melissa E. Bai, Wubin Cheng, Li-Chen Dinachali, Saman Safari Tu, Kun-Hua Huang, Tao Ross, Caroline A Massachusetts Institute of Technology. Department of Chemical Engineering Massachusetts Institute of Technology. Department of Materials Science and Engineering Lee, Keehong Kreider, Melissa E. Bai, Wubin Cheng, Li-Chen Dinachali, Saman Safari Tu, Kun-Hua Huang, Tao Ross, Caroline A The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f[subscript]PS = 68%, M[subscript n]= 53 kg mol[subscript -1]), the other with PDMS block as majority (f[subscript PDMS]= 67%, M[subscript n] = 44 kg mol [superscript -1] ). A 5 min UV irradiation was applied during solvent vapor annealing which led to both partial crosslinking of the polymer and a small increase in the temperature of the annealing chamber. This approach was effective for improving the correlation length of the self-assembled microdomain arrays and in limiting subsequent flow of the PDMS in the PDMS-majority BCP to preserve the post-anneal morphology. Ordering and orientation of microdomains were controlled by directed self-assembly of the BCPs in trench substrates. Highly-ordered perpendicular nanochannel arrays were obtained in the PDMS-majority BCP. 2017-11-15T16:16:15Z 2017-11-15T16:16:15Z 2016-10 2016-07 2017-10-16T23:15:03Z Article http://purl.org/eprint/type/JournalArticle 0957-4484 1361-6528 http://hdl.handle.net/1721.1/112191 Lee, Keehong, et al. “UV-Solvent Annealing of PDMS-Majority and PS-Majority PS-b-PDMS Block Copolymer Films.” Nanotechnology 27, 46 (October 2016): 465301 © 2016 IOP Publishing Ltd https://orcid.org/0000-0002-8554-6998 https://orcid.org/0000-0001-9975-9903 https://orcid.org/0000-0003-0559-8219 https://orcid.org/0000-0003-2262-1249 http://dx.doi.org/10.1088/0957-4484/27/46/465301 Nanotechnology Creative Commons Attribution 3.0 Unported license http://creativecommons.org/licenses/by/3.0/ application/pdf IOP Publishing IOP Publishing |
| spellingShingle | Ntetsikas, K Liontos, G Avgeropoulos, A Lee, Keehong Kreider, Melissa E. Bai, Wubin Cheng, Li-Chen Dinachali, Saman Safari Tu, Kun-Hua Huang, Tao Ross, Caroline A UV-solvent annealing of PDMS-majority and PS-majority PS- |
| title | UV-solvent annealing of PDMS-majority and PS-majority PS- |
| title_full | UV-solvent annealing of PDMS-majority and PS-majority PS- |
| title_fullStr | UV-solvent annealing of PDMS-majority and PS-majority PS- |
| title_full_unstemmed | UV-solvent annealing of PDMS-majority and PS-majority PS- |
| title_short | UV-solvent annealing of PDMS-majority and PS-majority PS- |
| title_sort | uv solvent annealing of pdms majority and ps majority ps |
| url | http://hdl.handle.net/1721.1/112191 https://orcid.org/0000-0002-8554-6998 https://orcid.org/0000-0001-9975-9903 https://orcid.org/0000-0003-0559-8219 https://orcid.org/0000-0003-2262-1249 |
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