UV-solvent annealing of PDMS-majority and PS-majority PS-

UV-solvent annealing of PDMS-majority and PS-majority PS-

The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f[subscript]PS = 68%...

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Dettagli Bibliografici
Autori principali:	Ntetsikas, K, Liontos, G, Avgeropoulos, A, Lee, Keehong, Kreider, Melissa E., Bai, Wubin, Cheng, Li-Chen, Dinachali, Saman Safari, Tu, Kun-Hua, Huang, Tao, Ross, Caroline A
Altri autori:	Massachusetts Institute of Technology. Department of Chemical Engineering
Natura:	Articolo
Pubblicazione:	IOP Publishing 2017
Accesso online:	http://hdl.handle.net/1721.1/112191 https://orcid.org/0000-0002-8554-6998 https://orcid.org/0000-0001-9975-9903 https://orcid.org/0000-0003-0559-8219 https://orcid.org/0000-0003-2262-1249

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