Near junction thermal management of GaN HEMTs via wafer bonding

Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2017.

Bibliographic Details
Main Author: Radway, Robert M
Other Authors: Tomás Palacios.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2018
Subjects:
Online Access:http://hdl.handle.net/1721.1/113116
_version_ 1826189864390885376
author Radway, Robert M
author2 Tomás Palacios.
author_facet Tomás Palacios.
Radway, Robert M
author_sort Radway, Robert M
collection MIT
description Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2017.
first_indexed 2024-09-23T08:25:47Z
format Thesis
id mit-1721.1/113116
institution Massachusetts Institute of Technology
language eng
last_indexed 2024-09-23T08:25:47Z
publishDate 2018
publisher Massachusetts Institute of Technology
record_format dspace
spelling mit-1721.1/1131162019-04-09T18:17:05Z Near junction thermal management of GaN HEMTs via wafer bonding Near junction thermal management of Gallium nitride high electron mobility transistors via wafer bonding Radway, Robert M Tomás Palacios. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science. Electrical Engineering and Computer Science. Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2017. This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections. Cataloged from student-submitted PDF version of thesis. Includes bibliographical references (pages 101-109). Gallium nitride (GaN)-based high electron mobility transistors (HEMTs) offer excellent performance in power conversion and high frequency power amplification. However, device self-heating limits reliable output power to 1/8th of reported maximums. Device-level thermal management is therefore critical for reliable high power operation. This thesis proposes and examines wafer bonded GaN-on-SiC HEMTs as a thermally efficient alternative to growth structures. This work first compares the thermal properties of this novel structure to the state-of-the-art. It then develops suitable wafer bonding techniques to fabricate this structure. In addition, the bonded interface thermal conductivity is measured via time domain thermoreflectance. The results of these measurements are analyzed to determine the thermal performance of the structure. In all, this thesis shows that the proposed bonded technology is a promising method for the fabrication of the next generation of GaN HEMTs. These devices are expected to perform at a level equivalent to GaN-on-diamond devices, although further process development is needed to achieve high bonding yields. by Robert M. Radway. M. Eng. 2018-01-12T20:57:02Z 2018-01-12T20:57:02Z 2017 2017 Thesis http://hdl.handle.net/1721.1/113116 1016449984 eng MIT theses are protected by copyright. They may be viewed, downloaded, or printed from this source but further reproduction or distribution in any format is prohibited without written permission. http://dspace.mit.edu/handle/1721.1/7582 109 pages application/pdf Massachusetts Institute of Technology
spellingShingle Electrical Engineering and Computer Science.
Radway, Robert M
Near junction thermal management of GaN HEMTs via wafer bonding
title Near junction thermal management of GaN HEMTs via wafer bonding
title_full Near junction thermal management of GaN HEMTs via wafer bonding
title_fullStr Near junction thermal management of GaN HEMTs via wafer bonding
title_full_unstemmed Near junction thermal management of GaN HEMTs via wafer bonding
title_short Near junction thermal management of GaN HEMTs via wafer bonding
title_sort near junction thermal management of gan hemts via wafer bonding
topic Electrical Engineering and Computer Science.
url http://hdl.handle.net/1721.1/113116
work_keys_str_mv AT radwayrobertm nearjunctionthermalmanagementofganhemtsviawaferbonding
AT radwayrobertm nearjunctionthermalmanagementofgalliumnitridehighelectronmobilitytransistorsviawaferbonding