Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS

Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS

Recent advances in the field of two-dimensional (2D) transition metal dichalcogenide (TMD) materials have indicated that atomic layer deposition (ALD) of the metal oxide and subsequent sulfidation could offer a method for the synthesis of large area two-dimensional materials such as MoS 2 with excel...

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Bibliographic Details
Main Authors: Bertuch, Adam, Provine, J., Sundaram, Ganesh, Ferralis, Nicola, Grossman, Jeffrey C., Keller, Brent D.
Other Authors: Massachusetts Institute of Technology. Center for Materials Science and Engineering
Format: Article
Published: American Chemical Society (ACS) 2018
Online Access:http://hdl.handle.net/1721.1/114819
https://orcid.org/0000-0003-4148-2424
https://orcid.org/0000-0003-1281-2359
https://orcid.org/0000-0001-8975-6434

Internet

http://hdl.handle.net/1721.1/114819
https://orcid.org/0000-0003-4148-2424
https://orcid.org/0000-0003-1281-2359
https://orcid.org/0000-0001-8975-6434

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