Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity
In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000 nm. At the visible range of the spectrum, fr...
| Main Authors: | , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Published: |
American Vacuum Society
2018
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| Online Access: | http://hdl.handle.net/1721.1/119017 https://orcid.org/0000-0002-4140-1404 |