Analysis of polysilicon critical dimension variation for submicron CMOS processes
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994.
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Thesis |
| Language: | eng |
| Published: |
Massachusetts Institute of Technology
2005
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1721.1/12028 |
| _version_ | 1826194106195378176 |
|---|---|
| author | Fitzgerald, Dawn Dougherty |
| author2 | Duane Boning, Charles Fine. |
| author_facet | Duane Boning, Charles Fine. Fitzgerald, Dawn Dougherty |
| author_sort | Fitzgerald, Dawn Dougherty |
| collection | MIT |
| description | Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994. |
| first_indexed | 2024-09-23T09:50:36Z |
| format | Thesis |
| id | mit-1721.1/12028 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T09:50:36Z |
| publishDate | 2005 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/120282019-04-11T13:27:48Z Analysis of polysilicon critical dimension variation for submicron CMOS processes Fitzgerald, Dawn Dougherty Duane Boning, Charles Fine. Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science Electrical Engineering and Computer Science Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1994. Includes bibliographical references (p. 139-140). by Dawn Dougherty Fitzgerald. M.S. 2005-08-16T21:59:59Z 2005-08-16T21:59:59Z 1994 1994 Thesis http://hdl.handle.net/1721.1/12028 31312048 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 140 p. 7154208 bytes 7153969 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
| spellingShingle | Electrical Engineering and Computer Science Fitzgerald, Dawn Dougherty Analysis of polysilicon critical dimension variation for submicron CMOS processes |
| title | Analysis of polysilicon critical dimension variation for submicron CMOS processes |
| title_full | Analysis of polysilicon critical dimension variation for submicron CMOS processes |
| title_fullStr | Analysis of polysilicon critical dimension variation for submicron CMOS processes |
| title_full_unstemmed | Analysis of polysilicon critical dimension variation for submicron CMOS processes |
| title_short | Analysis of polysilicon critical dimension variation for submicron CMOS processes |
| title_sort | analysis of polysilicon critical dimension variation for submicron cmos processes |
| topic | Electrical Engineering and Computer Science |
| url | http://hdl.handle.net/1721.1/12028 |
| work_keys_str_mv | AT fitzgeralddawndougherty analysisofpolysiliconcriticaldimensionvariationforsubmicroncmosprocesses |