High-throughput three-dimensional lithographic microfabrication

A 3D lithographic microfabrication process has been developed that is high throughput, scalable, and capable of producing arbitrary patterns. It offers the possibility for industrial scale manufacturing of 3D microdevices such as photonic crystals, tissue engineering scaffolds, and microfluidics chi...

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Bibliographic Details
Main Authors: Kim, Daekeun, So, Peter T. C.
Other Authors: Massachusetts Institute of Technology. Department of Mechanical Engineering
Format: Article
Published: The Optical Society 2019
Online Access:http://hdl.handle.net/1721.1/120522
https://orcid.org/0000-0003-4698-6488
Description
Summary:A 3D lithographic microfabrication process has been developed that is high throughput, scalable, and capable of producing arbitrary patterns. It offers the possibility for industrial scale manufacturing of 3D microdevices such as photonic crystals, tissue engineering scaffolds, and microfluidics chips. This method is based on depth-resolved wide-field illumination by temporally focusing femtosecond light pulses. We characterized the axial resolution of this technique, and the result is consistent with the theoretical prediction. As proof-of-concept experiments, we demonstrated photobleaching of 3D resolved patterns in a fluorescent medium and fabricating 3D microstructures with SU-8 photoresist.