High-throughput three-dimensional lithographic microfabrication

A 3D lithographic microfabrication process has been developed that is high throughput, scalable, and capable of producing arbitrary patterns. It offers the possibility for industrial scale manufacturing of 3D microdevices such as photonic crystals, tissue engineering scaffolds, and microfluidics chi...

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Main Authors: Kim, Daekeun, So, Peter T. C.
Other Authors: Massachusetts Institute of Technology. Department of Mechanical Engineering
Format: Article
Published: The Optical Society 2019
Online Access:http://hdl.handle.net/1721.1/120522
https://orcid.org/0000-0003-4698-6488
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author Kim, Daekeun
So, Peter T. C.
author2 Massachusetts Institute of Technology. Department of Mechanical Engineering
author_facet Massachusetts Institute of Technology. Department of Mechanical Engineering
Kim, Daekeun
So, Peter T. C.
author_sort Kim, Daekeun
collection MIT
description A 3D lithographic microfabrication process has been developed that is high throughput, scalable, and capable of producing arbitrary patterns. It offers the possibility for industrial scale manufacturing of 3D microdevices such as photonic crystals, tissue engineering scaffolds, and microfluidics chips. This method is based on depth-resolved wide-field illumination by temporally focusing femtosecond light pulses. We characterized the axial resolution of this technique, and the result is consistent with the theoretical prediction. As proof-of-concept experiments, we demonstrated photobleaching of 3D resolved patterns in a fluorescent medium and fabricating 3D microstructures with SU-8 photoresist.
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spelling mit-1721.1/1205222022-09-27T17:21:36Z High-throughput three-dimensional lithographic microfabrication Kim, Daekeun So, Peter T. C. Massachusetts Institute of Technology. Department of Mechanical Engineering Kim, Daekeun So, Peter T. C. A 3D lithographic microfabrication process has been developed that is high throughput, scalable, and capable of producing arbitrary patterns. It offers the possibility for industrial scale manufacturing of 3D microdevices such as photonic crystals, tissue engineering scaffolds, and microfluidics chips. This method is based on depth-resolved wide-field illumination by temporally focusing femtosecond light pulses. We characterized the axial resolution of this technique, and the result is consistent with the theoretical prediction. As proof-of-concept experiments, we demonstrated photobleaching of 3D resolved patterns in a fluorescent medium and fabricating 3D microstructures with SU-8 photoresist. Deshpande Center for Technological Innovation (Massachusetts Institute of Technology. School of Engineering) Singapore-MIT Alliance for Research and Technology (SMART) 2019-02-21T18:24:12Z 2019-02-21T18:24:12Z 2015-05 2019-01-03T16:57:59Z Article http://purl.org/eprint/type/JournalArticle 0146-9592 1539-4794 http://hdl.handle.net/1721.1/120522 Kim, Daekeun, and Peter T. C. So. “High-Throughput Three-Dimensional Lithographic Microfabrication.” Optics Letters 35, no. 10 (May 6, 2010): 1602. https://orcid.org/0000-0003-4698-6488 http://dx.doi.org/10.1364/OL.35.001602 Optics Letters Creative Commons Attribution-Noncommercial-Share Alike http://creativecommons.org/licenses/by-nc-sa/4.0/ application/pdf The Optical Society PMC
spellingShingle Kim, Daekeun
So, Peter T. C.
High-throughput three-dimensional lithographic microfabrication
title High-throughput three-dimensional lithographic microfabrication
title_full High-throughput three-dimensional lithographic microfabrication
title_fullStr High-throughput three-dimensional lithographic microfabrication
title_full_unstemmed High-throughput three-dimensional lithographic microfabrication
title_short High-throughput three-dimensional lithographic microfabrication
title_sort high throughput three dimensional lithographic microfabrication
url http://hdl.handle.net/1721.1/120522
https://orcid.org/0000-0003-4698-6488
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