In-situ depth monitoring for a deep reactive ion etcher using a white light interferometer with active vibration cancellation

Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2019

Bibliographic Details
Main Author:	Teale, Carson(Carson Arthur)
Other Authors:	Martin Schmidt and George Barbastathis.
Format:	Thesis
Language:	eng
Published:	Massachusetts Institute of Technology 2019
Subjects:	Electrical Engineering and Computer Science.
Online Access:	https://hdl.handle.net/1721.1/121726

Internet

https://hdl.handle.net/1721.1/121726