Enhancement of Optical Response in Nanowires by Negative-Tone PMMA Lithography

Enhancement of Optical Response in Nanowires by Negative-Tone PMMA Lithography

The method of negative-tone polymethyl methacrylate (PMMA) electron-beam lithography is investigated to improve the performance of nanowire-based superconducting detectors. Using this approach, the superconducting nanowire single-photon detectors (SNSPDs) have been fabricated from 5-nm-thick NbN fil...

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Bibliographic Details
Main Authors: Charaev, Ilya, Dane, Andrew, Agarwal, Akshay, Berggren, Karl K.
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Language:English
Published: Institute of Electrical and Electronics Engineers (IEEE) 2020
Online Access:https://hdl.handle.net/1721.1/124559

Internet

https://hdl.handle.net/1721.1/124559

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