Etching of glass, silicon, and silicon dioxide using negative ionic liquid ion sources
Ionic liquid ion sources have been proposed as a new type of ion source for focused ion beam and broad ion beam applications. In this paper, the ionic liquid EMI-BF 4 (1-ethyl-3-methylimidazolium tetrafluoroborate) was used as an ion source to generate negatively charged ions and irradiate glass (Py...
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| Format: | Article |
| Language: | English |
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American Vacuum Society
2020
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| Online Access: | https://hdl.handle.net/1721.1/126554 |