Etching of glass, silicon, and silicon dioxide using negative ionic liquid ion sources

Etching of glass, silicon, and silicon dioxide using negative ionic liquid ion sources

Ionic liquid ion sources have been proposed as a new type of ion source for focused ion beam and broad ion beam applications. In this paper, the ionic liquid EMI-BF 4 (1-ethyl-3-methylimidazolium tetrafluoroborate) was used as an ion source to generate negatively charged ions and irradiate glass (Py...

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Bibliographic Details
Main Author: Lozano, Paulo C
Other Authors: Massachusetts Institute of Technology. Department of Aeronautics and Astronautics
Format: Article
Language:English
Published: American Vacuum Society 2020
Online Access:https://hdl.handle.net/1721.1/126554

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