Growth, characterization and thermal stability of undoped and in-situ doped silicon-germanium heteroepitaxial layers
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1993.
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Format: | Thesis |
Idioma: | eng |
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Massachusetts Institute of Technology
2005
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Accés en línia: | http://hdl.handle.net/1721.1/12744 |