Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992.
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| Other Authors: | |
| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/13187 |
| _version_ | 1826203558167445504 |
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| author | Gray, David Charles |
| author2 | Herbert H. Sawin. |
| author_facet | Herbert H. Sawin. Gray, David Charles |
| author_sort | Gray, David Charles |
| collection | MIT |
| description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992. |
| first_indexed | 2024-09-23T12:38:56Z |
| format | Thesis |
| id | mit-1721.1/13187 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T12:38:56Z |
| publishDate | 2005 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/131872019-04-11T03:32:21Z Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2 Gray, David Charles Herbert H. Sawin. Massachusetts Institute of Technology. Dept. of Chemical Engineering Chemical Engineering Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992. Includes bibliographical references (p. 376-384). by David Charles Gray. Ph.D. 2005-08-15T16:47:04Z 2005-08-15T16:47:04Z 1992 1992 Thesis http://hdl.handle.net/1721.1/13187 26680838 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 618 p. 32344656 bytes 32344412 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
| spellingShingle | Chemical Engineering Gray, David Charles Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2 |
| title | Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2 |
| title_full | Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2 |
| title_fullStr | Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2 |
| title_full_unstemmed | Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2 |
| title_short | Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2 |
| title_sort | beam simulation studies of plasma surface interactions in fluorocarbon etching of si and sio2 |
| topic | Chemical Engineering |
| url | http://hdl.handle.net/1721.1/13187 |
| work_keys_str_mv | AT graydavidcharles beamsimulationstudiesofplasmasurfaceinteractionsinfluorocarbonetchingofsiandsio2 |