Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992.
Main Author: | Gray, David Charles |
---|---|
Other Authors: | Herbert H. Sawin. |
Format: | Thesis |
Language: | eng |
Published: |
Massachusetts Institute of Technology
2005
|
Subjects: | |
Online Access: | http://hdl.handle.net/1721.1/13187 |
Similar Items
-
Surface kinetics modeling of silicon oxide etching in fluorocarbon plasmas
by: Kwon, Ohseung, 1969-
Published: (2005) -
Interaction between graphene and the surface of SiO2
by: Chihaia, Viorel, et al.
Published: (2013) -
Controlling the assembly of proteins and cells on SiO₂ surfaces
by: Seong, Jiehyun, 1973-
Published: (2006) -
Dry reforming of methane over Ni/SiO2 and Ni-Mo/SiO2 catalysts
by: Toh, Serene York Ling.
Published: (2009) -
Evaluation of unsaturated fluorocarbons for dielectric Etch applications
by: Chatterjee, Ritwik, 1974-
Published: (2014)