Universal perpendicular orientation of block copolymer microdomains using a filtered plasma

Universal perpendicular orientation of block copolymer microdomains using a filtered plasma

© 2019, The Author(s). Sub-10 nm patterns prepared by directed self-assembly (DSA) of block copolymer (BCP) thin films offer a breakthrough method to overcome the limitations of photolithography. Perpendicular orientation of the BCP nanostructures is essential for lithographic applications, but diss...

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Bibliographic Details
Main Authors: Oh, Jinwoo, Suh, Hyo Seon, Ko, Youngpyo, Nah, Yoonseo, Lee, Jong-Chan, Yeom, Bongjun, Char, Kookheon, Ross, Caroline A, Son, Jeong Gon
Other Authors: Massachusetts Institute of Technology. Department of Materials Science and Engineering
Format: Article
Language:English
Published: Springer Science and Business Media LLC 2021
Online Access:https://hdl.handle.net/1721.1/134822

Internet

https://hdl.handle.net/1721.1/134822

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