Growth and characterization of low temperature silicon selective epitaxy
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/13640 |
| _version_ | 1826206669072236544 |
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| author | Yew, Tri-Rung |
| author2 | Rafael Reif. |
| author_facet | Rafael Reif. Yew, Tri-Rung |
| author_sort | Yew, Tri-Rung |
| collection | MIT |
| description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990. |
| first_indexed | 2024-09-23T13:36:24Z |
| format | Thesis |
| id | mit-1721.1/13640 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T13:36:24Z |
| publishDate | 2005 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/136402019-04-12T12:24:37Z Growth and characterization of low temperature silicon selective epitaxy Yew, Tri-Rung Rafael Reif. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering Materials Science and Engineering Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990. Includes bibliographical references (leaves 204-210). by Tri-Rung Yew. Ph.D. 2005-08-10T22:32:47Z 2005-08-10T22:32:47Z 1990 1990 Thesis http://hdl.handle.net/1721.1/13640 24250400 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 210 leaves 25288496 bytes 25288254 bytes application/pdf application/pdf application/pdf Massachusetts Institute of Technology |
| spellingShingle | Materials Science and Engineering Yew, Tri-Rung Growth and characterization of low temperature silicon selective epitaxy |
| title | Growth and characterization of low temperature silicon selective epitaxy |
| title_full | Growth and characterization of low temperature silicon selective epitaxy |
| title_fullStr | Growth and characterization of low temperature silicon selective epitaxy |
| title_full_unstemmed | Growth and characterization of low temperature silicon selective epitaxy |
| title_short | Growth and characterization of low temperature silicon selective epitaxy |
| title_sort | growth and characterization of low temperature silicon selective epitaxy |
| topic | Materials Science and Engineering |
| url | http://hdl.handle.net/1721.1/13640 |
| work_keys_str_mv | AT yewtrirung growthandcharacterizationoflowtemperaturesiliconselectiveepitaxy |