Quantitative Specifications to Avoid Degradation during E-Beam and Induced Current Microscopy of Halide Perovskite Devices

Quantitative Specifications to Avoid Degradation during E-Beam and Induced Current Microscopy of Halide Perovskite Devices

Copyright © 2020 American Chemical Society. Degradation due to electron beam exposure has posed a challenge in the use of electron microscopy to probe halide perovskite materials and devices. In this study, the interaction between the electron beam and the perovskite across acceleration voltages and...

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Bibliografski detalji
Glavni autori: Luo, Yanqi, Parikh, Pritesh, Brenner, Thomas M, Kim, Min-cheol, Wang, Rui, Yang, Yang, Correa-Baena, Juan-Pablo, Buonassisi, Tonio, Meng, Ying Shirley, Fenning, David P
Daljnji autori: Massachusetts Institute of Technology. Department of Mechanical Engineering
Format: Članak
Jezik:English
Izdano: American Chemical Society (ACS) 2021
Online pristup:https://hdl.handle.net/1721.1/138485

Internet

https://hdl.handle.net/1721.1/138485

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