Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform

Department of Energy (DOE)

Bibliographic Details
Main Authors: Xie, Qingyun, Yuan, Mengyang, Niroula, John, Greer, James A., Rajput, Nitul S., Chowdhury, Nadim, Palacios, Tomas
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Format: Article
Published: IEEE 2023
Online Access:https://hdl.handle.net/1721.1/150552
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author Xie, Qingyun
Yuan, Mengyang
Niroula, John
Greer, James A.
Rajput, Nitul S.
Chowdhury, Nadim
Palacios, Tomas
author2 Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
author_facet Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Xie, Qingyun
Yuan, Mengyang
Niroula, John
Greer, James A.
Rajput, Nitul S.
Chowdhury, Nadim
Palacios, Tomas
author_sort Xie, Qingyun
collection MIT
description Department of Energy (DOE)
first_indexed 2024-09-23T17:15:17Z
format Article
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institution Massachusetts Institute of Technology
last_indexed 2024-09-23T17:15:17Z
publishDate 2023
publisher IEEE
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spelling mit-1721.1/1505522023-04-25T03:00:44Z Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform Xie, Qingyun Yuan, Mengyang Niroula, John Greer, James A. Rajput, Nitul S. Chowdhury, Nadim Palacios, Tomas Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Department of Energy (DOE) National Aeronautics and Space Administration (NASA) Intel Corp. 2023-04-24T15:03:37Z 2023-04-24T15:03:37Z 2022-12-03 Article http://purl.org/eprint/type/ConferencePaper https://hdl.handle.net/1721.1/150552 Xie, Qingyun, Yuan, Mengyang, Niroula, John, Greer, James A., Rajput, Nitul S. et al. 2022. "Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform." 2022 International Electron Devices Meeting (IEDM). 10.1109/iedm45625.2022.10019401 2022 International Electron Devices Meeting (IEDM) Creative Commons Attribution-Noncommercial-Share Alike https://creativecommons.org/licenses/by-nc-sa/4.0/ application/pdf IEEE Qingyun Xie
spellingShingle Xie, Qingyun
Yuan, Mengyang
Niroula, John
Greer, James A.
Rajput, Nitul S.
Chowdhury, Nadim
Palacios, Tomas
Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform
title Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform
title_full Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform
title_fullStr Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform
title_full_unstemmed Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform
title_short Highly-Scaled Self-Aligned GaN Complementary Technology on a GaN-on-Si Platform
title_sort highly scaled self aligned gan complementary technology on a gan on si platform
url https://hdl.handle.net/1721.1/150552
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AT greerjamesa highlyscaledselfalignedgancomplementarytechnologyonaganonsiplatform
AT rajputnituls highlyscaledselfalignedgancomplementarytechnologyonaganonsiplatform
AT chowdhurynadim highlyscaledselfalignedgancomplementarytechnologyonaganonsiplatform
AT palaciostomas highlyscaledselfalignedgancomplementarytechnologyonaganonsiplatform