Advanced Epitaxy on 2D Materials for Bottom-up Heterointegration with Low-defects and Membrane Production with High-throughput

Conventional epitaxy has significantly advanced the semiconductor industry, driving remarkable progress in various application fields such as electronics and optoelectronics. However, several limitations of epitaxial techniques have impeded the development of next-generation electronic and optoelect...

Full description

Bibliographic Details
Main Author: Lu, Kuangye
Other Authors: Kim, Jeehwan
Format: Thesis
Published: Massachusetts Institute of Technology 2023
Online Access:https://hdl.handle.net/1721.1/151868