The effect of low energy ion bombardment on the crystallographic orientation of thin films

The effect of low energy ion bombardment on the crystallographic orientation of thin films

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1985.

Bibliographic Details
Main Author: Yu, Lock See
Other Authors: L. Rafael Reif.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2005
Subjects:
Materials Science and Engineering.
Online Access:http://hdl.handle.net/1721.1/15310

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