Controllable Transformation Matching Networks for Efficient RF Impedance Matching

Efficient and controlled delivery of radio-frequency (rf) power for semiconductor plasma processing typically relies upon tunable matching networks to transform the variable plasma load impedance to a fixed impedance suitable for most rf power amplifiers. Plasma applications require fast tuning spee...

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Bibliographic Details
Main Author: Rafa Islam, Khandoker N
Other Authors: Perreault, David J.
Format: Thesis
Published: Massachusetts Institute of Technology 2024
Online Access:https://hdl.handle.net/1721.1/153890