Remote Epitaxy by In-Situ Grown BN and InGaN Strain Relaxation
Compound semiconductors have superior material properties over silicon, making them good candidates for optoelectronics and power electronics. As the need for electronics with higher flexibility and smaller size increases, lift-off methods for fabricating freestanding compound semiconductors are dev...
मुख्य लेखक: | Liu, Yunpeng |
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अन्य लेखक: | Kim, Jeehwan |
स्वरूप: | थीसिस |
प्रकाशित: |
Massachusetts Institute of Technology
2024
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ऑनलाइन पहुंच: | https://hdl.handle.net/1721.1/155856 |
समान संसाधन
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Graded InGaN Buffers for Strain Relaxation in GaN/InGaN Epilayers Grown on sapphire
द्वारा: Chua, Soo-Jin, और अन्य
प्रकाशित: (2003) -
Graded InGaN Buffers for Strain Relaxation in GaN/InGaN Epliayers Grown on Sapphire
द्वारा: Song, T.L., और अन्य
प्रकाशित: (2003) -
InGaN quantum dots grown by MOVPE via a droplet epitaxy route
द्वारा: Rice, J, और अन्य
प्रकाशित: (2004) -
Optical studies of GaN nanocolumns containing InGaN quantum disks and the effect of strain relaxation on the carrier distribution
द्वारा: Holmes, M, और अन्य
प्रकाशित: (2012) -
Optical studies of GaN nanocolumns containing InGaN quantum disks and the effect of strain relaxation on the carrier distribution
द्वारा: Holmes, M, और अन्य
प्रकाशित: (2012)