High-efficiency metalenses for zone-plate-array lithography
To date, zone-plate-array lithography has employed an array of binary pi-phase zone plates, each 135 μm in diameter, operating at 405 nm wavelength, in conjunction with a spatial-light modulator and a moving stage, to expose large-area patterns in photoresist without a mask. Although the low focal e...
| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
American Vacuum Society
2024
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| Online Access: | https://hdl.handle.net/1721.1/156905 |