Integrated model-based run-to-run uniformity control for epitaxial silicon deposition.

Míreanna comhchosúla

• Run by run control : interfaces, implementation, and integration
  de réir: Moyne, William P. (William Patrick)
  Foilsithe / Cruthaithe: (2007)
• Run by run process control
  de réir: Ingólfsson, Ármann
  Foilsithe / Cruthaithe: (2005)
• An architecture for flexible distributed experimentation and control with an AME 5000 plasma etcher
  de réir: Gower, Aaron E. (Aaron Elwood)
  Foilsithe / Cruthaithe: (2005)
• Development of a run by run control benchmarking and simulation system
  de réir: Stuckey, Eric J. (Eric James), 1974-
  Foilsithe / Cruthaithe: (2010)
• Novel techniques for the run by run process control of chemical-mechanical polishing
  de réir: Smith, Taber H. (Taber Hardesty)
  Foilsithe / Cruthaithe: (2008)