Metrology of thin silicon expitaxial films : determination of epitaxial film thickness by Fourier-transform infra-red spectrometry

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.

Detalhes bibliográficos
Autor principal:	Cherkassky, Alexander (Alexander Peter), 1963-
Outros Autores:	Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science
Formato:	Tese
Idioma:	eng
Publicado em:	Massachusetts Institute of Technology 2005
Assuntos:	Electrical Engineering and Computer Science
Acesso em linha:	http://hdl.handle.net/1721.1/17405

Internet

http://hdl.handle.net/1721.1/17405