Metrology of thin silicon expitaxial films : determination of epitaxial film thickness by Fourier-transform infra-red spectrometry
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.
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Formato: | Tese |
Idioma: | eng |
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Massachusetts Institute of Technology
2005
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Acesso em linha: | http://hdl.handle.net/1721.1/17405 |