Metrology of thin silicon expitaxial films : determination of epitaxial film thickness by Fourier-transform infra-red spectrometry

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.

Detalhes bibliográficos
Autor principal: Cherkassky, Alexander (Alexander Peter), 1963-
Outros Autores: Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science
Formato: Tese
Idioma:eng
Publicado em: Massachusetts Institute of Technology 2005
Assuntos:
Acesso em linha:http://hdl.handle.net/1721.1/17405