X-ray lithographic alignment and overlay applied to double-gate MOSFET fabrication
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2003.
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Thesis |
| Language: | en_US |
| Published: |
Massachusetts Institute of Technology
2005
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1721.1/28271 |