Pattern-placement-error detection for spatial-phase-locked e-beam lithography (SPLEBL)

Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2004.

Bibliographic Details
Main Author:	Caramana, Cynthia L. (Cynthia Louise), 1978-
Other Authors:	Henry I. Smith.
Format:	Thesis
Language:	en_US
Published:	Massachusetts Institute of Technology 2005
Subjects:	Electrical Engineering and Computer Science.
Online Access:	http://hdl.handle.net/1721.1/28490

Internet

http://hdl.handle.net/1721.1/28490