Caramana, C. L., & Smith, H. I. (2005). Pattern-placement-error detection for spatial-phase-locked e-beam lithography (SPLEBL). Massachusetts Institute of Technology.
Chicago Style (17th ed.) CitationCaramana, Cynthia L., and Henry I. Smith. Pattern-placement-error Detection for Spatial-phase-locked E-beam Lithography (SPLEBL). Massachusetts Institute of Technology, 2005.
MLA (9th ed.) CitationCaramana, Cynthia L., and Henry I. Smith. Pattern-placement-error Detection for Spatial-phase-locked E-beam Lithography (SPLEBL). Massachusetts Institute of Technology, 2005.
Warning: These citations may not always be 100% accurate.