Pattern-placement-error detection for spatial-phase-locked e-beam lithography (SPLEBL)

Pattern-placement-error detection for spatial-phase-locked e-beam lithography (SPLEBL)

Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2004.

Bibliographic Details
Main Author: Caramana, Cynthia L. (Cynthia Louise), 1978-
Other Authors: Henry I. Smith.
Format: Thesis
Language:en_US
Published: Massachusetts Institute of Technology 2005
Subjects:
Electrical Engineering and Computer Science.
Online Access:http://hdl.handle.net/1721.1/28490

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