Fabrication process changes for performance improvement of an RF MEMS resonator : conformable contact lithography, Moiré alignment, and chlorine dry etching

Fabrication process changes for performance improvement of an RF MEMS resonator : conformable contact lithography, Moiré alignment, and chlorine dry etching

Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2005.

Bibliographic Details
Main Author: Sakai, Mark
Other Authors: David L. Carter and Harry L. Tuller.
Format: Thesis
Language:eng
Published: Massachusetts Institute of Technology 2006
Subjects:
Materials Science and Engineering.
Online Access:http://hdl.handle.net/1721.1/33401

Internet

http://hdl.handle.net/1721.1/33401

Similar Items