GaN Nanopore Arrays: Fabrication and Characterization
GaN nanopore arrays with pore diameters of approximately 75 nm were fabricated by inductively coupled plasma etching (ICP) using anodic aluminum oxide (AAO) films as etch masks. Nanoporous AAO films were formed on the GaN surface by evaporating an Al film onto a GaN epilayer and subsequently anodizi...
| 主要な著者: | , , , , |
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| フォーマット: | 論文 |
| 言語: | en_US |
| 出版事項: |
2003
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| 主題: | |
| オンライン･アクセス: | http://hdl.handle.net/1721.1/3827 |