Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films
Thesis (S.B. and S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996.
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| Format: | Thesis |
| Language: | eng |
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Massachusetts Institute of Technology
2008
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| Online Access: | http://hdl.handle.net/1721.1/41025 |
| _version_ | 1811079177687793664 |
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| author | Hubert, Brian Norio |
| author2 | John Vander Sande. |
| author_facet | John Vander Sande. Hubert, Brian Norio |
| author_sort | Hubert, Brian Norio |
| collection | MIT |
| description | Thesis (S.B. and S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996. |
| first_indexed | 2024-09-23T11:11:05Z |
| format | Thesis |
| id | mit-1721.1/41025 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T11:11:05Z |
| publishDate | 2008 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/410252020-04-07T21:40:44Z Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films Hubert, Brian Norio John Vander Sande. Massachusetts Institute of Technology. Department of Mechanical Engineering Mechanical Engineering Thesis (S.B. and S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996. Includes bibliographical references (leaves 73-77). In this work, a number of YBa2Cu3Ox-7 (YBCO) superconductor deposition systems developed by various laboratories are subjected to a critical review and analysis. Deficiencies in the design of these deposition processes, and deficiencies in the design of the mechanisms and tools used to carry out these processes are identified. Most of these deficiencies have resulted in either poor end-product performance or unlikely commercial viability. For example: pulsed laser deposition systems are capable of producing very high quality YBCO superconducting films, but their deposition rates are too slow to be commercially viable; liquidsource MOCVD systems can be precisely controlled, but the solvents they require tend to kill superconducting oxides; and solid-source MOCVD systems suffer from imprecise process control, thermal degradation of precursor materials, or both. A simple and affordable MOCVD system, called ConBrio, is proposed as an alternative to existing deposition systems. by Brian Norio Hubert. S.B.and S.M. 2008-03-27T18:46:30Z 2008-03-27T18:46:30Z 1996 1996 Thesis http://hdl.handle.net/1721.1/41025 42996973 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 77 leaves application/pdf Massachusetts Institute of Technology |
| spellingShingle | Mechanical Engineering Hubert, Brian Norio Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films |
| title | Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films |
| title_full | Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films |
| title_fullStr | Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films |
| title_full_unstemmed | Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films |
| title_short | Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films |
| title_sort | novel process and apparatus design for metalorganic chemical vapor deposition mocvd of superconducting thin films |
| topic | Mechanical Engineering |
| url | http://hdl.handle.net/1721.1/41025 |
| work_keys_str_mv | AT hubertbriannorio novelprocessandapparatusdesignformetalorganicchemicalvapordepositionmocvdofsuperconductingthinfilms |