A statistical metrology framework for characterizing ILD thickness variation in CMP processes
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1996.
| Main Author: | |
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| Other Authors: | |
| Format: | Thesis |
| Language: | eng |
| Published: |
Massachusetts Institute of Technology
2008
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| Online Access: | http://hdl.handle.net/1721.1/41383 |
| _version_ | 1826196049622990848 |
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| author | Chang, Eric Choong-Yin |
| author2 | James Chung, Duane Boning. |
| author_facet | James Chung, Duane Boning. Chang, Eric Choong-Yin |
| author_sort | Chang, Eric Choong-Yin |
| collection | MIT |
| description | Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1996. |
| first_indexed | 2024-09-23T10:20:02Z |
| format | Thesis |
| id | mit-1721.1/41383 |
| institution | Massachusetts Institute of Technology |
| language | eng |
| last_indexed | 2024-09-23T10:20:02Z |
| publishDate | 2008 |
| publisher | Massachusetts Institute of Technology |
| record_format | dspace |
| spelling | mit-1721.1/413832022-01-13T07:54:29Z A statistical metrology framework for characterizing ILD thickness variation in CMP processes Statistical metrology framework for characterizing inter-level dielectric thickness variation in chemical machine polishing. Chang, Eric Choong-Yin James Chung, Duane Boning. Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science Electrical Engineering and Computer Science Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1996. Includes bibliographical references (leaf 109). by Eric Choong-Yin Chang. M.Eng. 2008-04-23T14:53:15Z 2008-04-23T14:53:15Z 1996 1996 Thesis http://hdl.handle.net/1721.1/41383 35334677 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 109 leaves application/pdf Massachusetts Institute of Technology |
| spellingShingle | Electrical Engineering and Computer Science Chang, Eric Choong-Yin A statistical metrology framework for characterizing ILD thickness variation in CMP processes |
| title | A statistical metrology framework for characterizing ILD thickness variation in CMP processes |
| title_full | A statistical metrology framework for characterizing ILD thickness variation in CMP processes |
| title_fullStr | A statistical metrology framework for characterizing ILD thickness variation in CMP processes |
| title_full_unstemmed | A statistical metrology framework for characterizing ILD thickness variation in CMP processes |
| title_short | A statistical metrology framework for characterizing ILD thickness variation in CMP processes |
| title_sort | statistical metrology framework for characterizing ild thickness variation in cmp processes |
| topic | Electrical Engineering and Computer Science |
| url | http://hdl.handle.net/1721.1/41383 |
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