pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers

Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008.

Bibliographic Details
Main Author:	Shah, Mirat
Other Authors:	Darrell J. Irvine.
Format:	Thesis
Language:	eng
Published:	Massachusetts Institute of Technology 2008
Subjects:	Materials Science and Engineering.
Online Access:	http://hdl.handle.net/1721.1/43208

Internet

http://hdl.handle.net/1721.1/43208