Hyperthermal molecular beam dry etching of III-V compound semiconductors

Includes bibliographical references (p. 181-186).

Bibliographic Details
Main Author:	Hoshino, Isako.
Other Authors:	Clifton G. Fonstad, Jr.
Format:	Thesis
Language:	eng
Published:	Massachusetts Institute of Technology 2008
Subjects:	Materials Science and Engineering
Online Access:	http://hdl.handle.net/1721.1/43365

Internet

http://hdl.handle.net/1721.1/43365